Asanga H. Perera: search on Z-Library

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1

[IEEE 2008 4th International Conference on Information and Automation for Sustainability (ICIAFS) - Colombo, Sri Lanka (2008.12.12-2008.12.14)] 2008 4th International Conference on Information and Automation for Sustainability - Sinhala to English Language Translator

De Silva, Dilshan, Alahakoon, Asanga, Udayangani, Imesha, Kumara, Vishva, Kolonnage, Devinda, Perera, Harindu, Thelijjagoda, Samantha

Year:

2008

Language:

english

File:

PDF, 567 KB

english, 2008

2

A new positive novalac-based resist for sub-micron ebeam lithography

Asanga H. Perera, J.Peter Krusius

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 345 KB

english, 1990

3

Experimental verification of the impact of mosfet series resistance on device miniaturization down to source-drain areas as small as 0.2 μm by 0.3 μm

Asanga H. Perera, J. Peter Krusius

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 318 KB

english, 1990

4

All-level electron-beam lithography for trench isolated nano-metal–oxide semiconductor devices

Perera, Asanga H.

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

1990

Language:

english

File:

PDF, 879 KB

english, 1990

5

SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Sunday 20 September 1998)] Microelectronic Device Technology II - Performance, standby power, and manufacturability trade-off in transistor design consideration for 0.25-μm technology

Bhat, Navakanta, Chuang, Harry, Tsui, Paul, Woodruff, R., Grant, John, Kruth, R., Perera, Asanga H., Poon, Stephen, Collins, Sean, Dyer, D., Misra, Veena, Yang, I., Venkatesan, Suresh, Gilbert, Percy

Year:

1998

Language:

english

File:

PDF, 593 KB

english, 1998

6

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX - System-9: a new positive tone novalac-based high-resolution electron-beam resist

Perera, Asanga H., Krusius, J. P., Resnick, Douglas J.

Year:

1990

Language:

english

File:

PDF, 697 KB

english, 1990

7

SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Wednesday 1 October 1997)] Microelectronic Device Technology - Silicon bipolar transistor scaling for advanced BiCMOS SRAM applications

Tian, H., Perera, Asanga H., O'Meara, D., De, H., Subramanian, C. K., Rehmann, P., Hayden, James D., Herr, Norm, Rodder, Mark, Tsuchiya, Toshiaki, Burnett, David, Wristers, Dirk

Year:

1997

Language:

english

File:

PDF, 1.11 MB

english, 1997

8

SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Wednesday 1 October 1997)] Microelectronic Device Technology - Scaling self-aligned contacts for 0.25-μm and below

Perera, Asanga H., Pfiester, Jim R., Lii, Tom, Feng, Chris, Bhat, Mousumi, Dao, Thuy, Molloy, John, Blackwell, Michael, Cecil, Joe, Rodder, Mark, Tsuchiya, Toshiaki, Burnett, David, Wristers, Dirk

Year:

1997

Language:

english

File:

PDF, 749 KB

english, 1997

9

SPIE Proceedings [SPIE Microelectronic Manufacturing 1996 - Austin, TX (Wednesday 16 October 1996)] Microelectronic Device and Multilevel Interconnection Technology II - High-performance 0.25-um CMOS technology for fast SRAMs

Hayden, James D., McNelly, T. F., Perera, Asanga H., Pfiester, Jim R., Subramanian, C. K., Thompson, Matthew A., Chen, Ih-Chin, Sasaki, Nobuo, Patel, Divyesh N., Dixit, Girish A.

Year:

1996

Language:

english

File:

PDF, 2.12 MB

english, 1996